"19948","13","archive","3450",,,"disk0/00/01/99/48","2016-01-19 11:58:51","2016-01-19 12:00:08","2016-01-19 11:58:51","conference_item",,,"show",,,,"","","","","","","","","","",,,,"Influence of the composition of solutions HNO3-HI-glycerol on the process of chemical etching of CdTe and solid solution ZnхCd1-хTe and CdхHg1-хTe","english","CdTe and solid solutions based on it have a sufficiently wide practical application. To produce work elements using these semiconductor materials, first must prepare accordingly their surfaces, for which chemical-mechanical and chemical-dynamic polishing (CDP) were using.","CdTe, solid solutions,semiconductor materials, surfaces, chemical-mechanical, chemical-dynamic polishing (CDP).",,,,,,"","","","",,,,,,,"Гвоздієвський","Є. Є.","","","gvozd@zu.edu.ua","","pub","QD","sch_che","public",,"speech",,,"2015-05-11","published",,,,,,,"356",,"XV Міжнародна конференція з фізики і технології тонких плівок і наносистем","Івано-Франківськ","11 - 16 травня, 2015","conference",,,,,,"TRUE",,,,,,,,"",,"","",,"","",,,,,,"",,,,,,,"",,,,,"",,,,,"","",,,,,"","",