<mets:mets OBJID="eprint_19948" LABEL="Eprints Item" xsi:schemaLocation="http://www.loc.gov/METS/ http://www.loc.gov/standards/mets/mets.xsd http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-3.xsd" xmlns:mets="http://www.loc.gov/METS/" xmlns:mods="http://www.loc.gov/mods/v3" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"><mets:metsHdr CREATEDATE="2022-03-20T02:22:53Z"><mets:agent ROLE="CUSTODIAN" TYPE="ORGANIZATION"><mets:name>Zhytomyr State University Library</mets:name></mets:agent></mets:metsHdr><mets:dmdSec ID="DMD_eprint_19948_mods"><mets:mdWrap MDTYPE="MODS"><mets:xmlData><mods:titleInfo><mods:title>Influence of the composition of solutions HNO3-HI-glycerol on the process of chemical etching of CdTe and solid solution ZnхCd1-хTe and CdхHg1-хTe</mods:title></mods:titleInfo><mods:name type="personal"><mods:namePart type="given">Є. Є.</mods:namePart><mods:namePart type="family">Гвоздієвський</mods:namePart><mods:role><mods:roleTerm type="text">author</mods:roleTerm></mods:role></mods:name><mods:abstract>CdTe and solid solutions based on it have a sufficiently wide practical application. To produce work elements using these semiconductor materials, first must prepare accordingly their surfaces, for which chemical-mechanical and chemical-dynamic polishing (CDP) were using.</mods:abstract><mods:classification authority="lcc">QD Chemistry</mods:classification><mods:originInfo><mods:dateIssued encoding="iso8061">2015-05-11</mods:dateIssued></mods:originInfo><mods:genre>Conference or Workshop Item</mods:genre></mets:xmlData></mets:mdWrap></mets:dmdSec><mets:amdSec ID="TMD_eprint_19948"><mets:rightsMD ID="rights_eprint_19948_mods"><mets:mdWrap MDTYPE="MODS"><mets:xmlData><mods:useAndReproduction>
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