<oai_dc:dc xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
        <dc:relation>http://eprints.zu.edu.ua/30570/</dc:relation>
        <dc:title>Removing of thin layers from the CdTe and ZnxCd1-xTe surfaces by the HBr – K2Cr2O7 – ethylene glycol etching compositions</dc:title>
        <dc:creator>Chayka, M. V.</dc:creator>
        <dc:creator>Tomashік, Z. F.</dc:creator>
        <dc:creator>Tomashік, V. М.</dc:creator>
        <dc:creator>Denysyuк, R. О.</dc:creator>
        <dc:subject>QD Chemistry</dc:subject>
        <dc:date>2017</dc:date>
        <dc:type>Conference or Workshop Item</dc:type>
        <dc:type>NonPeerReviewed</dc:type>
        <dc:format>text</dc:format>
        <dc:language>uk</dc:language>
        <dc:identifier>http://eprints.zu.edu.ua/30570/1/%D0%97%D0%B1%D1%96%D1%80%D0%BD%D0%B8%D0%BA_%20%D0%9C%D1%96%D0%B6%D0%BD%D0%B0%D1%80%D0%BE%D0%B4%D0%BD%D0%B0%20%D0%BA%D0%BE%D0%BD%D1%84%D0%B5%D1%80%D0%B5%D0%BD%D1%86%D1%96%D1%8F%20%D0%B7%20%D1%84%D1%96%D0%B7%D0%B8%D0%BA%D0%B8%20%D1%96%20%D1%82%D0%B5%D1%85%D0%BD%D0%BE%D0%BB%D0%BE%D0%B3%D1%96%D1%97%20%D1%82%D0%BE%D0%BD%D0%BA%D0%B8%D1%85%20%D0%BF%D0%BB%D1%96%D0%B2%D0%BE%D0%BA%20%D1%96%20%D0%BD%D0%B0%D0%BD%D0%BE%D1%81%D0%B8%D1%81%D1%82%D0%B5%D0%BC-%D1%81%D1%82%D1%80%D0%B0%D0%BD%D0%B8%D1%86%D1%8B-182.pdf</dc:identifier>
        <dc:identifier>  Chayka, M. V. and Tomashік, Z. F. and Tomashік, V. М. and Denysyuк, R. О.  (2017) Removing of thin layers from the CdTe and ZnxCd1-xTe surfaces by the HBr – K2Cr2O7 – ethylene glycol etching compositions.  In: XVI International Conference “Physics and Technology of Thin Films and Nanosystems (dedicated to memory of Professor Dmytro Freik)”, May 15-20, 2017, Ivanо-Frankivsk.     </dc:identifier>
        <dc:language>english</dc:language></oai_dc:dc>