eprintid: 10520
rev_number: 25
eprint_status: archive
userid: 11
dir: disk0/00/01/05/20
datestamp: 2014-02-03 07:37:51
lastmod: 2015-08-15 05:39:13
status_changed: 2014-02-03 07:37:51
type: article
metadata_visibility: show
title: Mechanism of contact resistance formation in ohmic contacts with high dislocation density
language: english
abstract: A new mechanism of contact resistance formation in ohmic contacts with high dislocation density is
proposed. Its specific feature is the appearance of a characteristic region where the contact resistance
increases with temperature. According to the mechanism revealed, the current flowing through the
metal shunts associated with dislocations is determined by electron diffusion. It is shown that current
flows through the semiconductor near-surface regions where electrons accumulate. A feature of the
mechanism is the realization of ohmic contact irrespective of the relation between the contact and bulk
resistances. The theory is proved for contacts formed to III-V semiconductor materials as well as
silicon-based materials. A reasonable agreement between theory and experimental results is obtained
creators_name: Sachenкo, А. V.
creators_name: Belyaev, А. Е.
creators_name: Boltovets, N. S.
creators_name: Konaкova, R. V.
creators_name: Kudryк, Y. Y.
creators_name: Novytsкyі, S. V.
creators_name: Sheremet, V. N.
creators_name: Lі, J.
creators_name: Vіtusevіch, S. А.
ispublished: pub
subjects: QC
subjects: TK
divisions: sch_phy
full_text_status: public
date: 2012
date_type: published
publication: Journal of Applied Physics
volume: 111
number: 8
publisher: Американский институт физики
pagerange: 083701-083701
refereed: TRUE
issn: 0021-8979
official_url: ttp://jap.aip.org/
citation:   Sachenкo, А. V., Belyaev, А. Е., Boltovets, N. S., Konaкova, R. V., Kudryк, Y. Y., Novytsкyі, S. V., Sheremet, V. N., Lі, J., Vіtusevіch, S. А.  (2012) Mechanism of contact resistance formation in ohmic contacts with high dislocation density.  Journal of Applied Physics, 111 (8).  083701-083701.  ISSN 0021-8979     
document_url: http://eprints.zu.edu.ua/10520/1/Sachenko%20A.V.%20%28Mechanism%20of%20contact%20resistance%20formation%20in%20ohmic%20contacts%20with%20high%20dislocation%20density%29%202012.pdf