%0 Conference Paper
%A Гвоздієвський, Є. Є.
%B XV Міжнародна конференція з фізики і технології тонких плівок і наносистем
%C Івано-Франківськ
%D 2015
%F zu2:19948
%K CdTe, solid solutions,semiconductor materials, surfaces, chemical-mechanical, chemical-dynamic polishing (CDP).
%P 356
%T Influence of the composition of solutions HNO3-HI-glycerol on the process of chemical etching of CdTe and solid solution ZnхCd1-хTe and CdхHg1-хTe
%U http://eprints.zu.edu.ua/19948/
%X CdTe and solid solutions based on it have a sufficiently wide practical application. To produce work elements using these semiconductor materials, first must prepare accordingly their surfaces, for which chemical-mechanical and chemical-dynamic polishing (CDP) were using.