TY  - CONF
ID  - zu219948
UR  - http://eprints.zu.edu.ua/19948/
A1  - ?????????????, ?. ?.
Y1  - 2015/05/11/
N2  - CdTe and solid solutions based on it have a sufficiently wide practical application. To produce work elements using these semiconductor materials, first must prepare accordingly their surfaces, for which chemical-mechanical and chemical-dynamic polishing (CDP) were using.
KW  - CdTe
KW  -  solid solutions
KW  - semiconductor materials
KW  -  surfaces
KW  -  chemical-mechanical
KW  -  chemical-dynamic polishing (CDP).
TI  - Influence of the composition of solutions HNO3-HI-glycerol on the process of chemical etching of CdTe and solid solution Zn?Cd1-?Te and Cd?Hg1-?Te
M2  - ?????-??????????
AV  - public
T2  - XV ?????????? ??????????? ? ?????? ? ?????????? ?????? ?????? ? ??????????
ER  -