eprintid: 19948
rev_number: 13
eprint_status: archive
userid: 3450
dir: disk0/00/01/99/48
datestamp: 2016-01-19 11:58:51
lastmod: 2016-01-19 12:00:08
status_changed: 2016-01-19 11:58:51
type: conference_item
metadata_visibility: show
title: Influence of the composition of solutions HNO3-HI-glycerol on the process of chemical etching of CdTe and solid solution ZnхCd1-хTe and CdхHg1-хTe
language: english
abstract: CdTe and solid solutions based on it have a sufficiently wide practical application. To produce work elements using these semiconductor materials, first must prepare accordingly their surfaces, for which chemical-mechanical and chemical-dynamic polishing (CDP) were using.
keywords: CdTe, solid solutions,semiconductor materials, surfaces, chemical-mechanical, chemical-dynamic polishing (CDP).
creators_name: Гвоздієвський, Є. Є.
creators_id: gvozd@zu.edu.ua
ispublished: pub
subjects: QD
divisions: sch_che
full_text_status: public
pres_type: speech
date: 2015-05-11
date_type: published
pagerange: 356
event_title: XV Міжнародна конференція з фізики і технології тонких плівок і наносистем
event_location: Івано-Франківськ
event_dates: 11 - 16 травня, 2015
event_type: conference
refereed: TRUE
citation:   Гвоздієвський, Є. Є.  (2015) Influence of the composition of solutions HNO3-HI-glycerol on the process of chemical etching of CdTe and solid solution ZnхCd1-хTe and CdхHg1-хTe.  In: XV Міжнародна конференція з фізики і технології тонких плівок і наносистем, 11 - 16 травня, 2015, Івано-Франківськ.     
document_url: http://eprints.zu.edu.ua/19948/1/15_pr5_20.pdf